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MEMSnet Home: MEMS-Talk: um elastomer structures by UV patterning
um elastomer structures by UV patterning
2003-01-28
Patrik Möller
2003-01-29
Franck
2003-01-30
Erik Jung
2003-01-28
Bill Moffat
2003-01-29
Oray Orkun Cellek
um elastomer structures by UV patterning
Bill Moffat
2003-01-28
Patrik,
       Sounds like a photo sensitive Polymide.  Note of caution the level of
Oxygen present when you bake the Polymide determines the transparency.  Bill
Moffat

-----Original Message-----
From: Patrik Möller [mailto:[email protected]]
Sent: Tuesday, January 28, 2003 8:27 AM
To: [email protected]
Subject: [mems-talk] um elastomer structures by UV patterning


I´m looking for an elastomer/polymer formulation that can be UV-patterned to
form microstructures of 5-10um like a photoresist by spinning, softbaking, UV-
exposing, developing.

A modulus (E) of 3-8MPa would be great.

Strong adhesion to Au/epoxy surfaces, low dielectric constant, chemical
resistance and transparncy are desired properties.

Do anyone know of such a material and where it can be found?

Regards,

Patrik
Royal Institute of Technology
Stockholm
Sweden
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