Hello,
        I am trying to find an anisotropic silicon etchant which also
doesn't attack Aluminum.

I was told that TMAH doesnot attack Al. I tried etching under the
following conditions.

Concentration - TMAH 25% - rest water.
Temperature - 80C and also at 100C.

The Aluminum was removed under less than 15 mins. I would like any
information from about the etch conditions and also any other etchant
suitable for the purpose.

Thank You in advance,

Nandakumar.


--
K.Nandakumar.                                    Tel : (216) 368 4109 (Lab)
2504, Derbyshire Rd, #2,                               (216) 371 6746 (res)
Cleveland, OH 44106.                             Fax:  (216) 368 2668.