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MEMSnet Home: MEMS-Talk: Moving samples in RIE
Moving samples in RIE
2003-02-12
George C. Lopez
2003-02-13
[email protected]
2003-02-13
Henry Yang
2003-02-21
Yinbao Yang
Moving samples in RIE
Henry Yang
2003-02-13



George!

Long time no talk! How are you doing? I don't know if you know but I'm now
in San Jose. Anyhow, regarding to your question, what is the material for
your chamber base plate? I don't know Plasma Therm 790 very well, but what
we do for adapting various sized samples is to use In/Ga mix that is a
liquid in room temp. A little dab of thismaterial will hold your sample to
a bigger substrate while still providing good thermal conductivity.

Other typically used materials for base plate are stainless steel, or
carbon. I would imagine that carbon could be good for your holder since you
can just do a quick oxygen clean afterwards to get rid of sputtering
residues. Stainless steel doesn't sputter as much, but it is hard to come
off. Well, let me know if you want to talk over the phone over this. My
number is 408-927-2319. Take care!

Henry

--------------------------------------------------------------
Henry Yang
Mechanics and Micromechanics Group
Hitachi San Jose Research Center
408-927-2319



                      "George C. Lopez"
                                               cc:
                      Sent by:                  Subject:  [mems-talk] Moving
samples in RIE
                      mems-talk-bounces@
                      memsnet.org


                      02/12/2003 08:37
                      AM
                      Please respond to
                      General MEMS
                      discussion






MEMS-talk colleagues:
             We are performing a long SF6 etch on some thin silicon carbide
samples on
a Plasma Therm 790 RIE.  After the etching process is done, I discover that

some of the samples have flipped over or have moved to the extreme edge of
the chamber where the plasma is less intense.  I'm thinking of making a
holder that has wells where I can place the samples and having sufficient
weight that keeps it fixed in location.  Which material can this holder be
made of, such that it would not create a loading effect on the SF6 etch and

would not redeposit onto my sample due to the plasma energy?

Much obliged,
George


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