Bing
Two more things that were not mentioned. The most likely source of your N2
is an air leak, but if you just changed your source gas plumbing and/or
cylinder (if you use one) there is always the possibility that you have N2
hooked up instead of Ar. It's not likely but I thought I'd mention the
possibility before you start checking for leaks.
The second issue is that you may have chemically altered your targets. I
can't see how the Au target would be affected so you're lucky, if it was Al
or some other easily oxidised metal it might be toast and need replacing.
Au targets are expensive. The Si target may be adversely affected, but if
you have a research system that uses Si wafers, just change the wafer. If
not, you may have to recondition the target for a while before you get a
stable result that you would expect. Check your target and make sure you're
OK
Rick Williston
-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org]On Behalf Of Andy McQuarrie
Sent: Thursday, February 20, 2003 8:51 AM
To: General MEMS discussion
Subject: [mems-talk] Glow plasma color & leakage in a RF Sputtering
Hi Bing,
Pink plasma indicates N2 in the systems (ie air) - most likely case is that
you have a leak as you mention. Best course of action is to use a leak
checker or failing that a rate of rise check each time you blank off a
potential source.
Good luck.
Andy McQuarrie
Surface Technology Systems
Message text written by General MEMS discussion
>
We have a BOC Edwards Auto 500 Sputtering system. The normal glow plasma
color was light green, but it is pink. I still can deposit Au films with
lower deposition rate but not Si, instead I got transparent films. I
suspect the chamber has leakage and the Si could be oxidized. Does anybody
has the same experience? Please advice.
Bing
<
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