> Hi all, can anyone tell me if he'd worked with either:
> NH4OH:H2O2:H2O(1:1:5)  or
> H2O:H2O2:HF(20:1:1)
> as etchants for Titanium? What was the etch rate, and do you know of the
> selectivity over SiO2?

Measured etch rates in titanium wet etchant 20 H2O : 1 H2O2 (30%) : 1 HF
(49%):
Titanium: 1100 nm/min
Thermal oxide: 12 nm/min
Annealed PSG: 210 nm/min

    --Kirt Williams, Ph.D.     consultant