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MEMSnet Home: MEMS-Talk: C4F8 etchant
C4F8 etchant
2003-04-03
[email protected]
2003-04-08
Isaac Wing Tak Chan
2003-04-03
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2003-04-04
Burkhard Volland
2003-04-04
Jason Viotty
2003-04-06
Philip Lau
C4F8 etchant
[email protected]
2003-04-03
Anupama:

Do you have the ability to add some CF4 to your plasma ash tool? Try using a
96:4 ratio of CF4:O2 at 100 watts for 5 minutes. You might have to experiment
with time to get best results but if you are dealing with an inorganic residue
of some sort it should take it off. Pressure around 250 mtorr. Bob Henderson

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