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  • MEMs shunt switch (Marita Canare)
  • Photoresist spining on corrugated wafers (li gang)
  • isotropic wet silicon etching. (li gang)
  • Fabrication of micro structure based on PMMA (reinhardt)
  • galvanic etching... (phil.lau@baesystems.com)
  • Photoresist spining on corrugated wafers (David Nemeth)
  • plasma cleaner vs. RIE (Smith Gabriel L (Gabe) IHMD)
  • isotropic wet silicon etching. (李佳鴻)
  • Photoresist spining on corrugated wafers (Luesebrink Helge)
  • isotropic wet silicon etching. (Klauder, Jr., Philip R.)
  • O2 Plasma Descum (Robinson, Sarah)
  • Photoresist spining on corrugated wafers (mark)
  • Regarding Testing of cMUTs (Babu(Panduga))
  • photoresist heat capacity (Andrey Bayrashev)
  • Optical transmission at high temperatures (Joyce Wong)
  • MEMs shunt switch (Hyun -Ju Seo)
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Harrick Plasma
Tanner EDA
Process Variations in Microsystems Manufacturing
MEMStaff Inc.
Tanner EDA by Mentor Graphics
Mentor Graphics Corporation