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  • Re: SU8 & KOH (BERAUER,FRANK (HP-Singapore,ex7))
  • thick photoresist for dry etching (mennabli@grundfos.com)
  • SU-8 photocatalyst diffusion constants (Jacques Jonsmann)
  • thick photoresist for dry etching (Mihaela Balseanu)
  • How to select the adhesion metal for glass wafer ? (3319(李宗璟)Vincent)
  • Metal mask for anisotropic etching in EDP, KOH (Prem Pal)
  • PDMS (Shay Kaplan)
  • Is there such polymer? (Michael D Martin)
  • Re: SJR-5740 issues (Mark Shaw)
  • RE: SU 8 PHOTORESIST (Franck CHOLLET) (Mark Shaw)
  • Re : Dispensing of SU8-100 (Mark Shaw)
  • Metal mask for anisotropic etching in EDP, KOH (kirt_williams@agilent.com)
  • Re: hydroxyl functional crosslinker (Jeff Classey)
  • How to select the adhesion metal for glass wafer ? (Mighty Platypus)
  • Dry film resist for greyscale lithography? (Fred C Thomas III)
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