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BCB 4024-40 EXPOSURE (#ZHOU QIAOER#)
cross section of membrane (ypy0816)
HSbF6 diffusion coefficient (
[email protected]
)
Photoresist for Silicon DRIE (Stephan Biber)
Photoresist for Silicon DRIE (OVERSTOLZ Thomas Christian)
Anodic bonding - implant damage? (Michel Godin)
Re: Photoresist for Silicon DRIE (Stephen Arnold)
PTFE Plasmapolymerization in AOE chamber (Marco Doms)
Re: Surface Stress & Cantilever (Michel Godin)
Re: Surface Stress & Cantilever (Michel Godin)
Re: PTFE Plasmapolymerization in AOE chamber (Philip Choi)
Photoresist for Silicon DRIE (Shane Arthur McColman)
Substrate Wetting (Adamson, Steve)
Cross section photo of membrane (John Maloney)
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