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  • Wrinkles on the sidewall of SU-8 layer (郑瑞麟(Ruilin Zheng))
  • AFM scratch photoresist for nanograting (Jeff Kettle)
  • Chemical Etchants for Ag (basar bolukbas)
  • Integrating a thick dielectric layer surrounding suspended silicon nitride membranes (Michael D Martin)
  • Integrating a thick dielectric layer surrounding suspended silicon nitride membranes (Ken Healy)
  • 20um features using AZP4620 (Haixin Zhu)
  • Integrating a thick dielectric layer surrounding suspended silicon nitride membranes (Roger Shile)
  • Wrinkles on the sidewall of SU-8 layer (Oakes Garrett)
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Process Variations in Microsystems Manufacturing