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  • patterning sub-micron holes in chromium (Wendell McCulley)
  • patterning sub-micron holes in chromium (Daniel Figura)
  • patterning sub-micron holes in chromium (D.Grimm@ifw-dresden.de)
  • PDMS surface treatment (DEBASHIS MAJI)
  • SiO2 RIE etching without carbonizing the photoresist (weiquan yang)
  • PDMS surface treatment (Shirla Cheng)
  • AZ 9260 processing (Daniel Figura)
  • 50 nm resist (Daniel Figura)
  • 50 nm resist (Robert Black)
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Harrick Plasma
Tanner EDA
The Branford Group
Process Variations in Microsystems Manufacturing
Harrick Plasma, Inc.
Mentor Graphics Corporation